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IWJT2008 May 15 - 16, 2008 Shanghai, China
8th International Workshop on Junction Technology
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The 8th International Workshop on Junction Technology (IWJT2008) will be held on May 15 - 16, 2008 in Shanghai, China. The IWJT, started in 2000 and was held annually in Japan or China, is an open forum focused on the needs and interest of the community of a junction formation technology in semiconductors. At the past IWJTs, a number of eminent and experienced scientists and engineers from Asia, America, and Europe presented their latest results on junction technology. The workshop will provide a good opportunity for researchers and engineers to present their new research results, and exchange ideas with leading scientists in this field.
Paper Presentation Information 1. Oral Presentation Presentation time: Keynote speech (40 min): 35 min Talk Time + 5 min Q/A (question/answer) Invited paper (30 min): 25min Talk Time + 5 min Q/A Contributed paper (20 min): 17 min Talk Time + 3 min Q/A A computer and a PC-compatible projector will be provided in each meeting room. Presenters may bring either a CD-ROM, a USB driver, or his/her own laptop to the meeting room. All the presentation files are preferred to be copied into that computer before the session (unless the format of the Powerpoint file does not match well in that computer). Student helpers will assist the presenters before and during the session. 2. Poster Presentation Poster size: 90cm(wide)X120cm(high) Poster setting-up time: before 19:30 on May 15 (Thur.) Poster presentation time: 19:30-21:00 on May 15 (Thur.) Poster display time: 19:30-21:00 on May 15 (Thur.) Co-Sponsored by
Technical Co-Sponsored by
Supported by
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