IWJT2008 May 15 - 16, 2008 Shanghai, China

8th International Workshop on Junction Technology
 Hotel Equatorial

　

　

The Best Paper Award of IWJT2007

　

Is Awarded to

(1) S8-3

T. Hoffmann, T. Noda, S. Felch, S. Severi, V. Parihar, H. Forstner, C. Vrancken, M. de Potter, B. van Daele, H. Bender, M. Niwa, R. Schreutelkamp, W. Vandervorst, S. Biesemans and P. P. Absil

 For their paper titled

Laser Annealed Junctions: Process Integration Sequence Optimization for Advanced CMOS Technologies
　

　

(2) S4-4

Y. Momiyama, K. Okabe, H. Nakao, M. Kojima, M. Kase and T. Sugii


For their paper titled


 Extension Engineering using Carbon co-Implantation Technology for Low Power CMOS Design with Phosphorus- and Boron-Extension